Physics-Based Parasitic Extraction Software
CLEVER - Custom Cell Parasitic Extraction/Optimization

• The most accurate fully automated
   
• Complete parasitic RC extraction tool
   
• Fully takes account of all processing and photolithography effects
   
• 100% physics based extraction, not rule based extraction
   
• Physics based optical solver for photolithography
   
• Includes de-focus, line pinching and other optical effects
   
• Includes photoresist development physics for over/under develop effects
   
• Fully automated 3D builder - no user meshing required
   
• Complete built-in spice netlist extractor
   
• Includes intuitive, easy to use layout editor (GDSII)
   
• Virtual masks created by layer combinations can also be exported and viewed
   
• Includes powerful 2D and 3D structure viewing tools
   
• 3D cutlines from all angles can be viewed
   
• Intuitive structure building commands (e.g. deposit oxide thick=1)
   
• Parasitic structures can be viewed at all stages of construction
   
• Ideal for cell layout verification, since full 3D structure can be viewed
   
• Ideal for cell process AND layout cell optimization
   
• Automatically creates netlist with distributed resistance and capacitance
   
• User defined materials for new dielectrics (eg Lok) and conductors
   
• Automated electrode labeling
   
• Runs on Linux and Unix platforms
   
• Internal netlist reduction and coupling possible to HIPEX CRC
   
• Critical net analysis
   
• User defined accuracy
   

STELLAR - Standard Cell Parasitic Capacitance Extraction

• Accurate, 100% Physics Based Capacitance Extraction Tool for larger cells
   
• For users who require highly accurate extraction for larger cells but who are not concerned about process related corner rounding effects
   
• Creates parasitic capacitance SPICE netlist
   
• GDSII layout and technology driven structure generation
   
• Use of variables allows creation of process design of experiments (DOE)
   
• Intuitive interactive GUI interface
   
• Includes 3D viewing tool for structure analysis and verification
   
• Includes Mask Viewer/Editor for GDSII layout formats
   
• Dual meshing algorithm allows efficient high speed numerics
   
• Runs on Linux and Unix platforms
   
• Includes Worksheet and Optimizer tools for data analysis and plotting
   
• Includes scripting language for results analysis
   
• Hidden layer capabilities
   
• Allow merge of vias
   
• Multi-via pad connectors correctly simulated
   
• Take into account floating conductors
   
• Allow to stop and restart the simulation
   

QUEST - High Frequency Modeling

• Accurate physics based extractor: Inductance, Capacitance, Resistance and Capacitive Loss Extraction
   
• Calculated RLCG values dependent frequency
   
• Creates an 18 element, frequency independent inductor SPICE model
   
• Creates a 6 element, frequency dependent inductor SPICE model
   
• Creates 2 port or Multi-port S-parameter netlists for use in RF Spice
   
• Creates W-Element Transmission line SPICE models
   
• Allows analysis of full (RLCG) parasitic coupling effects between lines
   
• GDSII layout and technology driven structure generation
   
• Allows creation of square and octagonal inductors
   
• Multi-via pad connectors correctly simulated
   
• Merge of vias possible
   
• Takes account of substrate loss effects.
   
• Use of variables allows creation of process design of experiments (DoE)
   
• Allow statistical process variation analysis by using tonyplot in production mode
   
• Allows creation of analytical models by using the Optimizer tool included
   
• Intuitive interactive GUI interfac
   
• Includes 3D viewing tool for structure analysis and verification
   
• Includes Mask Viewer/Editor for GDSII layout formats
   
• Dual meshing algorithm allows efficient high speed numerics
   
• Runs on Linux and Unix platforms
   
• Take into account floating conductors
   

EXACT - Capacitance Rule File Generator

• 3D field solver calculates interconnect capacitance models to deliver highest accuracy LPE rule files without compromising extraction performance
   
• Intuitive and user-friendly graphical interface for process layer description and test structure definition for beginner and experienced process technology developers
   
• Standard mode of operation handles most conventional processes whereas advanced mode can be used for more complex and non-planar process definitions
   
• Integrated scripting language provides custom LPE rule files for other extraction tools
   
• Powerful statistical analysis module option available to calculate variations of capacitance using known process margins to account for interconnect process variation
   
• Powerful 3D solver supports non-planar semiconductor profiles for accurately modeling irregular etch profiles, dual damascene, and low-K dielectrics
   
• Automatic model / rule file generation for HIPEX, Simucad’s full chip LPE tool
   
• Automatic input file generation and submission to 3D field solver
   
• Menu-driven parameterized layout generator for test structure and pattern generation
   
• Easy LPE rule file generation with LISA scripting language
   
• Flexible architecture for fitting raw parasitic data into a wide range of custom equations for xCalibre™, Calibre™ xRC™, and Diva/Dracula LPE™
   
• Process and layout preview
   
• Batch mode option allows automated characterization runs
   
• Advanced mode operation gives experienced user access to the more advanced process models
   
• Ability to perform statistical analysis on capacitance variations
   
• Easy to understand extracted capacitance tables that facilitate the analysis of the experiment
   
• Support Multi-processor machines
   
• Auto selection of 1D/2D/3D modes
   
• Interconnect parasitic capacitance modeling support for planar and non-planar dielectrics
   
• Low-K dielectric and copper damascene process
   
• Conformal dielectrics deposition
   
• Sub-wavelength lithographic effects due to optical proximity correction (OPC)
   
• Process variations impact on interconnect capacitance
   
• Statistical analysis and worst-case parasitic analysis by applying known process margins to extracted data
   
• Powerful 3D solver supports non-planar semiconductor profiles for accurately modeling irregular etch profiles, dual damascene, and low-K dielectrics
   
• 3D field solver calibrates interconnect capacitance models to deliver highest accuracy LPE rule files without compromising extraction performance
   
• Built-in Optimizer enables improved fitting and process optimization
   
• Ability to simulate dummy metal
   

Rev# 092805_05