CLEVER
RC Extractor for Realistic 3D Structures

CLEVER is a 3D physics-based RC extractor that uses GDSII mask data and process information to create a realistic 3D structure using its built-in 3D etch/deposit processor and optolithographical simulator. CLEVER back annotates extracted RCs into SPICE netlist.

Key Features

• A must have tool for deep submicron CMOS, MEMS, TFT, and Memory technologies
  
• True 3D field solver with realistic 3D process offers the highest interconnect RC extraction accuracy and fast feedback to process and layout modifications
  
• Only RC extractor in the industry capable of reproducing the lithographic effects of Optical Proximity Correction (OPC) sub wavelengths effects, phase-shifts mask (PSM), misalignment, defocus , and DCD
  
• Direct linking of semiconductor process information to IC layout parasitic extraction without the loss of accuracy which results from curve-fitting parasitic data to empirical formulas
  
• User selectable boundary conditions, material names and properties
  

Rev. 110507_22