CLEVER
RC Extractor for Realistic 3D Structures

CLEVER is a physics-based RC extractor that uses GDSII mask data and process information to create a realistic 3D structure for MEMS, advanced CMOS, TFT, Memory cells, etc., using its built-in etch/deposit processor and optolithographical simulator. CLEVER back annotates extracted RCs into SPICE netlist.

Key Features

True 3D field solver with advanced lithography and realistic etch deposition models resulting in the highest possible interconnect RC extraction accuracy
No restriction on geometry size 65nm, 45nm and below
Fast feedback for optimization of circuit performance as a function of back end process and layout parameters
Solution based Adaptive Local Mesh Refinement creates an optimal mesh automatically for best accuracy and speed
User selectable boundary condition, material property, and solution tolerance control
Automatic back annotation of field solved resistances and capacitances onto extracted active device netlist for immediate SPICE analysis
Only RC extractor in the industry capable of reproducing the lithographic effects of Optical Proximity Correction (OPC) sub wavelength effects, phase-shifts mask (PSM), misalignment, defocus, and delta (CD)