ModelLib Dynamically-Linked SPICE Models
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HV MOS
BSIM3-based High Voltage Compact Model
HiSIM HV
Surface Potential Based HV and LDMOS Compact Model
PSP
Surface Potential-Based MOSFET Model
BSIM3v3.2.4
Industry Standard
Sub-0.13 Micron
MOSFET Model
BSIMMG
Berkeley Common Multi-Gate Transistor Model
BSIM3SOIv3.2
Industry Standard
SOI Model
BSIM4v4
Industry Standard
Sub-0.13 Micron
MOSFET Model
EKV
Low Power
MOSFET Model
HICUM
High Speed
Bipolar Model
Mextram
General Purpose
Bipolar Model
Modella
Lateral PNP
Bipolar Model
Mosvar
PSP-Based MOS
Varactor Model
UOTFT
Universal Organic TFT Model
VBIC
Advanced BJT and HBT Model
ModelLib
Latest ModelLib Models
An Advanced Innovative CMOS Model
HiSIM was developed at Hiroshima University, in collaboration with the STARC research center. This model employs the drift-diffusion approximation, correctly modeling the surface potential in the channel.
Conventional MOSFET models often use unphysical parameters to smooth characteristics between the different operation modes. Since HiSIM needs only one set of equations, valid over all modes of operation, only physical parameters are necessary. Therefore, HiSIM is not only accurate, but also reduces the number of parameters needed to model a MOSFET device.
The HiSIM approach results in :
Physical Effects
HiSIM accounts for the following effects:
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| Gate intrinsic capacitance vs VGS |
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| Surface potentials vs VGS |
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| ID=f(VD) characteristic |
Circuit Simulation Examples
HiSIM demonstrates accuracy better than BSIM4 at high simulation speeds. HiSIM is a general purpose model suitable for accurate analog and large circuit simulations over 1 million transistors. Its convergence properties are far better than any other commercial CMOS model.
Key Properties
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| Example 1: HiSIM simulation shows good accuracy |
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| Example 2: DAC 90nm circuit functionality |
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| Example 3: 2k RAM circuit |
Simucad Implementation
Rev. 101807_04
More about HiSIM: